Trademark: 76328621
Status Date
Friday, February 11, 2011
Registration Number
2859315
Registration Date
Tuesday, July 6, 2004
Filing Date
Monday, October 22, 2001
Published for Opposition
Tuesday, April 13, 2004
Cancellation Date
Friday, February 11, 2011
9 Semiconductor wafer processing equipment, namely, thermal treatment reactors, chemical vapor deposition reactors and plasma enhanced chemical vapor deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by chemical vapor deposition or plasma-enhanced chemical vapor deposition; as well as components and replacement parts thereof
Feb 11, 2011
Cancelled Sec. 8 (6-Yr)
Jun 14, 2007
Case File In Ticrs
Jul 6, 2004
Registered-Principal Register
Apr 13, 2004
Published For Opposition
Mar 24, 2004
Notice Of Publication
Sep 27, 2002
Approved For Pub - Principal Register
Sep 26, 2002
Examiners Amendment Mailed
Aug 16, 2002
Non-Final Action Mailed
Jul 2, 2002
Sec. 1(B) Claim Deleted
Jul 2, 2002
Correspondence Received In Law Office
Jul 2, 2002
Paper Received
Jan 2, 2002
Non-Final Action Mailed
Dec 19, 2001
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
