Trademark: 76328620
Status Date
Friday, September 20, 2013
Registration Number
2688160
Registration Date
Tuesday, February 18, 2003
Filing Date
Monday, October 22, 2001
Published for Opposition
Tuesday, November 26, 2002
Cancellation Date
Friday, September 20, 2013
9 Semiconductor wafer processing equipment, namely, thermal treatment reactors, chemical vapor deposition reactors, and plasma-enhanced chemical vapor deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by chemical vapor deposition or plasma-enhanced chemical vapor deposition, as well as components and replacement parts thereof
Sep 20, 2013
Cancelled Sec. 8 (10-Yr)/Expired Section 9
Jul 26, 2011
Teas Change Of Correspondence Received
Feb 21, 2009
Registered - Sec. 8 (6-Yr) Accepted & Sec. 15 Ack.
Feb 17, 2009
Assigned To Paralegal
Feb 12, 2009
Teas Section 8 & 15 Received
May 28, 2008
Case File In Ticrs
Feb 18, 2003
Registered-Principal Register
Nov 26, 2002
Published For Opposition
Nov 6, 2002
Notice Of Publication
Sep 27, 2002
Approved For Pub - Principal Register
Sep 26, 2002
Examiners Amendment Mailed
Sep 25, 2002
Previous Allowance Count Withdrawn
Jul 2, 2002
Sec. 1(B) Claim Deleted
Sep 6, 2002
Approved For Pub - Principal Register
Jul 2, 2002
Correspondence Received In Law Office
Jul 2, 2002
Paper Received
Jan 2, 2002
Non-Final Action Mailed
Dec 19, 2001
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
