1 Chemicals for any of storage, dispensing, abatement, and purification of gases; Chemical source material for the deposition of thin films for the manufacture of semiconductors; Chemicals for industrial purposes; Chemical adsorbents for separating constituents in fluids; Chemical adsorbents for separating impurities or other constituents in industrial flow streams; Chemical adsorbents applied to a substrate for separating constituents in fluids; Chemical adsorbents applied to a substrate for separating impurities or other constituents in industrial flow streams; Chemical adsorbents for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; Chemical adsorbents to be applied to substrates for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; Chemical adsorbents for separating organic or inorganic constituents in fluids comprising pharmaceutical or biopharmaceutical ingredients; Chemical adsorbents to be applied to substrates for separation of organic or inorganic impurities in fluids; Chemical adsorbents to be applied to substrates to be used as filters for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; Scaffold-based chemical compounds to physically or chemically carry, enclose, or stabilize active constituents for enabling controlled release, constituent delivery, catalytical reactions, imaging signal enhancement, or analytical characterization
Trademark: 98146163
