7 apparatus and instruments for thin film processing, namely, direct atomic layer deposition tools for plasma atomic layer deposition, thermal atomic layer deposition, atomic layer epitaxy, etch tools for atomic layer etching and cluster tools for etching; machines and instruments for thin film processing, namely, atomic layer deposition tools for plasma atomic layer deposition, thermal atomic layer deposition, atomic layer epitaxy, etch tools for atomic layer etching and cluster tools for etching with automated handling; computers and computer programs for atomic scale layer deposition apparatus
Trademark: 98144502
