Word

ENTEGRIS

Status

Pending

Status Code

630

Status Date

Saturday, May 20, 2023

Serial Number

98000427

Mark Type

4000

Filing Date

Wednesday, May 17, 2023

Trademark Owner History

Entegris, Inc.

Classifications

9 Controllers in the nature of analog and digital mass flow controllers for industrial gases; vapor controllers; articles used in laboratories, in the pharmaceutical, biotechnology, food, and chemical processing industries, and in industrial manufacturing plants namely, carriers for semiconductor wafers and substrates and handles therefor, storage boxes and covers for semiconductor wafers and substrates, shipping container and handling trays for semiconductor wafers, substrates, and photoplates; Automated gas flow controllers and gas flow monitors; Automatic valve assemblies; Bioprocessing systems primarily comprised of mixing hardware, plastic or synthetic bioreactor containers for cell culturing of bioprocess m

7 Work piece holder used to retain wafers in semiconductor manufacturing tools; Chemical processing machines; Chemical-mechanical planarization pad conditioners; Dispensing pumps for fluids in the microelectronics industry; Electric welding machines for welding plastic tubing and fittings and machines for primarily washing, and secondarily drying semiconductor and magnetic disk carriers, boxes and shipping containers; Filters for machines for manufacturing microelectronics, and for filtration of water and liquid chemicals; Filters for semiconductor manufacturing machines and machine systems used for removing contaminants, particulate matter, particles, impurities, molecular contaminants; Gas filters and purifiers for semiconductor manufacturing tools; Gas filters, namely, filters for machines having traps for obtaining a sample of a gas-phase contaminant from a gas, gas filtering systems comprising gas filters for machines and housings and fittings therefore, and sampling devices for obtaining a sample of a gas contaminant from a gas for use in connection with industrial installations, semiconductor processing systems, and semiconductor processing tools used in the manufacture of semiconductors; High viscosity fluid dispensing systems comprised of pumps, filters and related electronics for use in the microelectronics industry; Housing for disposable liquid filter cartridges for use in the microelectronics industry; Industrial machinery and parts therefore, namely, integrated filtration-liquid chemical dispense systems comprising pumps, filters and related electronics for low and high viscosity fluids including photochemicals, dielectrics, slurries, polyimides and epoxies; Industrial machinery and parts therefore, namely, filter manifolds; re-usable filter housings for machines; gas, vacuum and liquid valves, namely, motor controlled gas, vacuum and liquid valve machines; Liquid filtration and purification subsystems composed of filters and housings to remove undesirable particles, gels and other contaminants from wet chemicals in semiconductor manufacturing applications; Machine parts for semiconductor machinery, namely, brush rollers for removing detritus from polished surfaces of silicon wafers after planarization; Machines and machine parts, namely, devices for removing contaminants from gas, namely, gas filters, gas filtering systems and gas monitoring systems being parts of machines for use in connection with the gas industry, semiconductor processing systems, and semiconductor processing tools; Machines for manufacturing embossed carrier tape and cover tape; Machines for packaging semiconductor components in embossed carrier tape and cover tape; Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for use in the manufacture of advanced integrated circuit devices within the semiconductor industry

6 Carriers, made primarily of metal, used in the manufacture, storage and transport of semiconductor wafers; Clamps made primarily or exclusively of metal for securing together plastic fittings, tubing supports and plastic valves used for plastic tubing and pipe; Gas supply equipment for storing gases and dispensing such gases on demand, namely, a metal vessel holding the gas in a pressurized or liquid form, with a flow control valve and regulator, for on-demand dispensing of such gas; manually operated, metal inlet and outlet valves; manually operated, metal manifolds for transferring chemicals; Metal chemical delivery cabinets for housing metal containers, valves, manifolds and pipes of metal; Metal containers with inlet and outlet valves, for storage and delivery of chemicals; Metal gas supply containers holding adsorbent material for use in storing adsorbed gas and from which gas can be desorbed for dispensing from the container; Metal gas vessels holding gases for manufacturing semiconductors, solar panels, and flat panel displays; metal manifolds for use in chemical delivery systems for transferring chemicals; Metal supports and hangers for plastic tubing and pipe for carrying fluids including gasses, liquids and slurries; Pipes and tubes of metal for transferring chemicals; Sub-atmospheric pressure gas storage and dispensing systems for gases for manufacturing semiconductors, solar panels, and flat panel displays, comprised of empty metal gas supply containers used for holding adsorbents with gases for manufacturing semiconductors, solar panels, and flat panel displays adsorbed thereon; Sub-atmospheric pressure storage and dispensing systems for industrial gases, comprised of metal gas supply containers holding adsorbents with industrial gases adsorbed thereon

3 Industrial abrasives, namely, abrasive compounds for lapping and polishing semiconductors, silicon wafers, glass and metal surfaces; Chemical cleaner directed to the electronics industry; Post-copper chemical mechanical planarization (cmp) cleaning solution for use in the manufacturing and processing of semiconductors; Chemical cleaning solution for processing of integrated circuit (ic) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors; Abrasive preparations, namely, chemical cleaners, namely, abrasive dispersion slurries and cleaning and polishing preparations for use in the finishing of electronic components and substrates, optical components, glass, metals, plastics, machinery, computer parts, magnetic data-storage disks and heads

1 Adsorbed gas for use in the manufacture of semi-conductors and microelectronic products, as provided in a gas supply container holding adsorbent material; Absorbing carbons for general industrial use; Chemical compositions for use in removing microelectronics manufacturing fabrication materials from microelectronic products such as wafers and microelectronic devices that are recycled following the removal of such materials; Chemical gases sold with gas supply equipment for storing gases and dispensing such gases on demand, namely, chemical gases sold in a metal vessel holding the gas in a pressurized or liquid form, with a pressure regulator within said vessel and a flow control valve for on-demand dispensing of such gas for use in semiconductor manufacturing; chemical products, namely, chemical compositions for use in vapor deposition processes; Chemical compositions, namely, reagents for use in the manufacture of semiconductors in the electronics and semiconductor manufacturing industry; Chemical compositions, namely, reagents, namely, epitaxial thin film materials, organometallic source reagent compounds and complexes, and ion implantation materials, all for use in the electronics and semiconductor manufacturing industry; Chemical source material in the nature of chemical compositions for depositing films on substrates in the manufacture of semiconductors, flat panel displays, and solar panels; Chemical source material in the nature of chemical compositions for the deposition of thin films on semiconductor wafers for the manufacture of semiconductors; Chemicals for treating hazardous gases in semiconductor applications; Chemicals for use in chemical reagent delivery systems for use in the manufacture of semiconductors; Chemicals for use in manufacture of semiconductors, integrated circuits, flat-panel displays, solar panels, and photovoltaic products; Chemicals for vapor deposition metallization; Composite materials, namely, composites comprised of polymers and carbon nanotubes for use in the further manufacture of molded articles; Gas provided in a gas supply container holding adsorbent material for use in the manufacture of semiconductors and for use in other industrial processes; Gases for use in the manufacture semiconductors, microelectronics, solar panels, and flat panel displays, as provided in gas supply vessels and for on-demand dispensing of such gas for use in such manufacturing; Processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs and recording media; Chemical compositions, namely, semiconductor manufacturing chemical reagents; Sub-atmospheric pressure gas sources, namely, gases adsorbed on adsorbents in gas supply containers for use in the manufacture of semiconductors, microelectronics, solar panels and flat panel displays; Sub-atmospheric pressure gas storage and dispensing systems for gases for manufacturing semiconductors, solar panels, and flat panel displays, comprised of adsorbents with gases for manufacturing semiconductors, solar panels, and flat panel displays adsorbed thereon, not including natural gas or natural gas dehydration or purification machines; Sub-atmospheric pressure gas, namely, gases for manufacturing semiconductors, solar panels, and flat panel displays, not including natural gas; Sub-atmospheric pressure gases for ion implantation and chemical vapor deposition; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for use in the manufacture of advanced integrated circuit devices within the semi-conductor industry; Chemical solutions for use in the manufacturing and processing of semiconductors, namely, photoresist stripper, benzotriazole (bta) and l-proline solution; Fumed silica dispensed in water used to polish semiconductors; Aqueous metal oxide dispersions for use in semiconductor polishing; Chemical additives, namely, abrasive dispersions for use in the manufacture of electronic components and substrates, optical components, metals, machinery, computer parts, and magnetic data-storage disks and heads; High purity chemical compositions for electronic component manufacture; Chemical compositions for use in semiconductor manufacturing, solar cell panel manufacturing and flat panel display manufacturing; Chemical compositions for removal of photoresist and post-etch residues in the manufacture of semiconductors, integrated circuits and related products; Chemicals for use in industry and science; Chemical preparations for use in industry and science, namely, for use in the semiconductor and micro-electronics industries; Chemical mechanical polishing (cmp) slurry and chemical mechanical planarization (cmp) slurry for use in the manufacturing and processing of semiconductors in the optoelectronics and photonics industries; Chemicals, namely, polymer-containing drag reducers and flow improvers to increase flow of hydrocarbons through pipelines

Trademark Events

May 20, 2023

New Application Entered