Word

QXP+

Status

Pending

Status Code

692

Status Date

Tuesday, March 26, 2024

Serial Number

97911172

Mark Type

4000

Filing Date

Thursday, April 27, 2023

Trademark Owner History

Eugenus, Inc.

Classifications

40 Processing of semiconductors or deposition of thin films on substrates; Consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces

9 Recorded computers software for semiconductor processing or for thin film deposition; Semiconductor testing apparatus; Computer software for use in processing semiconductor wafers; Electronic semiconductor control, checking and measuring devices, namely, computer hardware and recorded computer software for use in measuring, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; Semiconductors; Downloadable computer control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; Downloadable computer operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; Electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces

7 Machines for semiconductor processing / manufacturing; Machines for thin film deposition; Semiconductor chip manufacturing equipment, namely, semiconductor chip manufacturing machines; Semiconductor wafer processing equipment; Semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; Machines for the production of semiconductors; Robots, vacuum systems, motors and engines, drive units, and parts of machines for operating semiconductor manufacturing machines; Injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; Metal organic vapor deposition equipment, namely, vapor deposition apparatus for semiconductor processing machines, and chemical vapor deposition apparatus for use in manufacturing semiconductors

11 Industrial apparatus using air to assist in the drying and cleaning of components in the semiconductor industry

42 Scientific, technological, and industrial research and development services for semiconductor processing or deposition of thin films on substrates; Scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for CVD, PECVD, ALD and AVD of thin films onto surfaces; Industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films

QXP PLUS

Trademark Events

Mar 26, 2024

Withdrawn From Pub - Og Review Query

Mar 11, 2024

Approved For Pub - Principal Register

Mar 8, 2024

Teas/Email Correspondence Entered

Mar 8, 2024

Correspondence Received In Law Office

Mar 8, 2024

Teas Response To Office Action Received

Dec 11, 2023

Notification Of Non-Final Action E-Mailed

Dec 11, 2023

Non-Final Action E-Mailed

Dec 11, 2023

Non-Final Action Written

Nov 30, 2023

Assigned To Examiner

May 25, 2023

New Application Office Supplied Data Entered

May 1, 2023

New Application Entered