1 Nitrogen trifluoride; tungsten hexafluoride; monosilane; gas for processing semiconductor, namely, Hydrogen Fluoride, HydroFluoric acid, Dilute Hydrogen Fluoride and ammonia; detergents for industrial use, namely, detergents for use in the manufacture of semiconductors; detergents for use in manufacturing processes; etchants for use in the manufacture of semiconductors; detergents for industrial use, namely, detergents for use in manufacturing process; perfluorinated chemical compounds prepared synthetically for use in manufacture of semiconductors, electronic equipment, automobiles and office automation equipment; silanes; chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; chemicals for use in the manufacture of solar cells, namely, lithium hexafluorophosphate; chlorides, namely, Silicon tetrachloride, Dichlorosilane, Monochlorosilane, zinc chloride, silver chloride, magnesium chloride, lime chloride, aluminum chloride; chlorofluorocarbons; carbon fluorochloride; etching solutions for use in the manufacture of semiconductors or etching solutions for silicon compounds and metal; caustics for industrial purposes; corrosive preparations, namely, chemical solutions in the nature of multi-metal corrosion and scale inhibitor treatments for hydronic heating and cooling systems; corrosive preparations, namely, chemical solutions for use in the manufacture of semiconductors; acids, namely, nitric acid, carbonic acid, phosphoric acid, sulfuric acid; inorganic acids; sulfuric acid
Trademark: 97379944
