Trademark: 97122998
Status Date
Tuesday, September 19, 2023
Filing Date
Friday, November 12, 2021
Published for Opposition
Tuesday, April 4, 2023
7 System comprised of plasma etching machines for etching extreme ultraviolet photomasks used to pattern wafers for semiconductor manufacturing
Feb 7, 2024
Teas Change Of Correspondence Received
Feb 7, 2024
Attorney/Dom.Rep.Revoked And/Or Appointed
Feb 7, 2024
Teas Revoke/App/Change Addr Of Atty/Dom Rep Received
Feb 7, 2024
Applicant/Correspondence Changes (Non-Responsive) Entered
Feb 7, 2024
Teas Change Of Owner Address Received
Sep 21, 2023
Notice Of Approval Of Extension Request E-Mailed
Sep 19, 2023
Sou Extension 1 Granted
Sep 19, 2023
Sou Extension 1 Filed
Sep 19, 2023
Sou Teas Extension Received
May 30, 2023
Noa E-Mailed - Sou Required From Applicant
Apr 4, 2023
Official Gazette Publication Confirmation E-Mailed
Apr 4, 2023
Published For Opposition
Mar 15, 2023
Notification Of Notice Of Publication E-Mailed
Feb 28, 2023
Approved For Pub - Principal Register
Feb 24, 2023
Teas/Email Correspondence Entered
Feb 24, 2023
Correspondence Received In Law Office
Feb 24, 2023
Teas Response To Office Action Received
Sep 6, 2022
Notification Of Non-Final Action E-Mailed
Sep 6, 2022
Non-Final Action E-Mailed
Sep 6, 2022
Non-Final Action Written
Aug 23, 2022
Assigned To Examiner
Nov 19, 2021
New Application Office Supplied Data Entered
Nov 16, 2021
New Application Entered
Trademark Alertz updated from USPTO on 2030-01-24
