1 chemicals used in industry; chemicals used in science; chemicals for use in industry and science, having liquid crystal properties; chemicals used in the manufacture of semiconductor chips; chemical preparations for use in industry for industrial purposes; chemicals for use in industry, namely, liquid and gaseous chemicals, chemical compositions, precursors, chemical agents, intermediates, reagents, chemical products in the nature of preparations and preparations for use in the electronics semiconductor, and microelectromechanical industries; chemicals, chemical compositions, chemical gases and chemical mechanical planarization slurries for use in the electronics industry to manufacture silicon based and compound semiconductors, flat panel displays, thin film transistor-liquid crystal displays, photovoltaics, microelectromechanical and other electronic components; chemicals and chemical preparations, namely, chemical compositions, and chemical preparations in the forms of liquids and gases, the foregoing for use in industry and science, and particularly for cleaning, chemical mechanical planarization, doping, lasering, etching, metallization, photoresist stripping, surface preparation, wafer cleaning, thin film deposition, chamber cleaning, post chemical mechanical planarization cleaning, and residue removal for use on electronic semiconductors and microelectromechanical devices; chemicals, namely, namely, high purity and ultra-high purity chemical gases for the manufacture of electronics, semiconductor, and microelectromechanical devices; detergents for substrate for use in manufacture of semiconductors; detergents for semi-conductor wafers for use in the manufacture of semiconductors; detergents for semiconductors for use in the manufacture of semiconductors; chemicals for use in the manufacture of silicon wafers, semiconductor devices and liquid crystal displays; chemicals for use in industry, namely, corrosion inhibitors for use in the electronics industry being industrial chemicals used to prevent the corrosion of metallic substrates during the processing of integrated circuits and computer chips; chemicals for used in manufacturing, namely, solvents and etchants for use in the electronics industry being chemicals used for material removal in the processing of substrate layers during the manufacturing of integrated circuits and computer chips; chemicals for use in industry, namely, photoresist strippers for use in the electronics industry; metal plating chemical compositions, namely, electrolytic acid copper solutions for plating copper in manufacturing of integrated circuits and computer chips; solvents, namely, solvent type processing compositions for use in the electronics industry, chemicals for use in industry in the nature of potting and encapsulation removers, photoresist removers and strippers, polyimide removers, electrically conductive adhesive substances for use in industry, electrically conductive chemical coatings used in the manufacture of printed circuit boards; formulated solvent blends, namely, solvent type processing compositions for removal of adhesives, urethanes, epoxies, silicones, acrylics, polyimide, flux and other polymers and resins, the foregoing for use in the in the electronics industry; ultra-high purity materials being chemical preparations for use in the semiconductor industry, namely, boron tribromide, phosphorous oxychloride, phosphorous tribromide, silicon tetrabromide, arsenic trichloride, arsenic tribromide and antimony pentachloride; photoresists and etching solutions for residue removal and cleaning substrate surfaces for use in semiconductor manufacturing; polyurethane (PU) adhesive for industrial purposes, namely, for use in the fabrication of flat panel display screens; unprocessed polyurethane resins, namely, polyurethane dispersion used as an electrically semi-resistive adhesive or binder between the electronic backplane and the electrophoretic media of an electrophoretic visual display screen or device; formulated chemical slurries for use in restoration of dielectric constant in semiconductor surface preparation and cleaning; chemicals, for use in science and industry, namely, optically transparent fluids and additives for immersion lithography; chemicals for use in science and industry, namely, aqueous chemical formulations for rinsing or conditioning photoresist in lithographic processing in electronics fabrication; chemicals for use in science and industry, namely, chemicals for production of porous insulating dielectric films in integrated circuit fabrication; chemical reagents used to selectively fluorinate other chemical compounds, other than for medical or veterinary use; silane for use in the photovoltaics industry; ammonia for use in the photovoltaics, lighting and semiconductor industries; chemical compositions for use in industry, namely, nitrogen trifluoride for use in the photovoltaics, display and semiconductor industries; chemical compositions for use in industry, namely, fluorine for use in the photovoltaics industry, semiconductor industry and automatic industry at it relates to plastic blow molding; chemical compositions for use in industry, namely, fluorocarbons for use in the photovoltaics, display and semiconductor industries; salts, for industrial purposes; alkalies; ethyl alcohol; glycerine for industrial purposes; sulfur; non-metallic oxides; chemicals, namely, high purity tetramethylcyclotetrasiloxane, for the manufacture of micro electronic devices; ammonia for general industrial use, for use in manufacturing and for use in processes for the production of lasers and light emitting diodes; silicon detergent for industrial use, namely, for use in manufacturing processes; aluminum oxide particles; silicon dioxide particles; metal oxide particles; unprocessed artificial resins; silicic chemicals; silicic unprocessed artificial resins; silicic unprocessed plastics; photoresists, namely, acid or alkali-resistant nonconducting coating used to protect desired portions of a circuit pattern from the action of the etchant in the manufacture of semiconductor devices; ceramic precursor chemicals for use in science and industry; chemicals in liquid form used as an anti-reflective coating for photo resists for use in science, industry, photography; organic chemicals, inorganic chemicals and photoresists for use in the manufacture of products and components for the electronics and semiconductor industry; pre-treating solutions, namely, etching solutions, plating solutions, for preparing base material prior to the application of photo resists in the fields of integrated circuits, semi-conductors and panel displays; chemical preparations in the nature of thinners for photoresists for use in industry, and chemical additives for photo resists for use in industry, and touch-up solutions, namely, plating solutions, for use in combination with photo resists; photographic chemicals, namely, deletion fluids; mineral chemical products based on silicate, namely, silica sols and silica suspensions; mordants for metal