1 Chemical preparations for industrial purposes; chemicals and chemical compositions for use in coatings, inks, adhesives, composites for the following industries, namely, construction, civil engineering, personal care, institutional and industrial cleaning, mining and oil refining; epoxy resins, unprocessed; polyurethanes; chemicals and chemical compositions for use as catalysts and additives in making polyurethane foam, curing agents and auxiliary products for epoxy systems, surfactants for formulated systems, and functional additives for industrial cleaning and mining industries; chemicals and chemical compositions for use as chemical intermediates, curatives, defoamers and deaerators, dispersants, emulsifying agents, epoxy accelerators and catalysts, epoxy adhesion promoters, epoxy curing agents, epoxy diluents and modifiers, epoxy resins, fluorinating reagents, personal care ingredients, polyurethane catalysts, polyurethane processing aids, surfactants and urethane or acrylic hybrids; chemicals, namely, liquid and gaseous chemicals, chemical compositions, precursors, chemical agents, intermediates, reagents, chemical products and preparations for use in the electronics semiconductor in microelectromechanical industries; Chemicals, chemical compositions, chemical gases and chemical mechanical planarization slurries for use in the electronics industry to manufacture silicon and compound semiconductors, flat panel displays, thin film transistor-liquid crystal displays, photovoltaics, microelectromechanical and other electronic components; chemicals and chemical compositions, liquids and gases for cleaning, chemical mechanical planarization, doping, lasering, etching, metallization, photoresist stripping, surface preparation, wafer cleaning, thin film deposition, chamber cleaning, post chemical mechanical planarization cleaning, and residue removal of electronic semiconductors and microelectromechanical devices; gases, namely, high purity and ultra-high purity chemical gases for the manufacture of electronics, semiconductor, and microelectromechanical devices; Plastic adhesives for industrial purposes, not for stationery or household purposes; Unprocessed plastics; Detergents for industrial use; detergents for industrial use as part of manufacturing operations; Detergents for substrate for use in manufacture of semiconductor; Detergents for semi-conductor wafers for use in manufacture of semiconductors; Detergents for semiconductors for use in manufacture of semiconductor; chemicals for use in the manufacture of silicon wafers, semiconductor devices and liquid crystal displays; corrosion inhibitors for use in the electronics industry being industrial chemicals used to prevent the corrosion of metallic substrates during the processing of integrated circuits and computer chips; etchants for use in the electronics industry being chemicals used for material removal in the processing of substrate layers during the manufacturing of integrated circuits and computer chips; photoresist strippers for use in the electronics industry; chemical solutions for plating copper in manufacturing of integrated circuites and computer chips; Solvents, namely, solvent type processing compositions for use in the electronics industry, potting and encapsulation removers, photoresist removers and strippers, polyimide removers, and electrically conductive adhesives and coatings; Formulated solvent blends for removal of adhesives, urethanes, epoxies, silicones, acrylics, polyimide, flux and other polymers and resins in industrial and electronic applications; ultra-high purity materials being chemical preparations for use in the semiconductor industry, namely, boron tribromide, phosphorous oxychloride, phosphorous tribromide, silicone tetrabromide, arsenic trichloride, arsenic tribromide and antimony pentachloride; Photoresist and etching solutions for residue removal and cleaning substrate surfaces for use in semiconductor manufacturing; Polyurethane (PU) adhesive for use in the fabrication of flat panel display screens; polyurethane dispersion used as an electrically semi-resistive adhesive or binder between the electronic backplane and the electrophoretic media of an electrophoretic visual display screen or device; formulated chemicals used in restoration of dielectric constant in semiconductor surface preparation and cleaning; Chemicals, namely, optically transparent fluids and additives for immersion lithography; Aqueous chemical formulations for rinsing or conditioning photoresist in lithographic processing in electronics fabrication; Chemicals for production of porous insulating dielectric films in integrated circuit fabrication; reagents used to selectively fluorinate other chemical compounds, other than for medical or veterinary use; Argon for use in the photovoltaics industry; hydrogen for use in the photovoltaics industry; nitrogen for use in the photovoltaics industry; carbon monoxide for use in the photovoltaics industry; oxygen for use in the photovoltaics industry; silane for use in the photovoltaics industry; ammonia for use in the photovoltaics industry; helium for use in the photovoltaics industry; nitrogen trifluoride for use in the photovoltaics industry; fluorine for use in the photovoltaics industry; fluorocarbons for use in the photovoltaics industry; salts, for industrial purposes; alkalis,; ethyl alcohol; glycerin for industrial purposes; Sulphur; non-metallic oxides; Chemicals, namely, high purity tetramethylcyclotetrasiloxane, for the manufacture of micro electronic devices; ammonia for general industrial use, for use in manufacturing and for use in processes for the production of lasers and light emitting diodes; silicon detergent for industrial use