Trademark: 87635690
Word
ANGSTROM ENGINEERING
Status Date
Tuesday, February 11, 2020
Registration Number
5980509
Registration Date
Tuesday, February 11, 2020
Filing Date
Thursday, October 5, 2017
Published for Opposition
Tuesday, November 26, 2019
1 Physical and chemical vapor deposition machines for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, atomic layer deposition; materials, namely, metals, non-metals, ceramics, oxides, nitrides, organic compounds and polymers, used in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology
7 Vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, deposition system components, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation
40 Custom designing, developing and manufacturing of physical and chemical vapor deposition systems for others; custom designing, developing and manufacturing of vacuum equipment and systems used for thin film deposition, etching and cleaning for others; custom designing, developing and manufacturing vacuum equipment and systems used for controlled environment and space simulation for others
42 Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation
Feb 11, 2020
Registered-Principal Register
Nov 26, 2019
Official Gazette Publication Confirmation E-Mailed
Nov 26, 2019
Published For Opposition
Nov 6, 2019
Notification Of Notice Of Publication E-Mailed
Oct 22, 2019
Law Office Publication Review Completed
Oct 21, 2019
Approved For Pub - Principal Register
Oct 15, 2019
Examiner's Amendment Entered
Oct 12, 2019
Notification Of Examiners Amendment E-Mailed
Oct 12, 2019
Examiners Amendment E-Mailed
Oct 12, 2019
Examiners Amendment -Written
Sep 25, 2019
Teas/Email Correspondence Entered
Sep 25, 2019
Correspondence Received In Law Office
Sep 19, 2019
Assigned To Lie
Sep 11, 2019
Teas Response To Suspension Inquiry Received
Apr 22, 2019
Notification Of Inquiry As To Suspension E-Mailed
Apr 22, 2019
Inquiry To Suspension E-Mailed
Apr 22, 2019
Suspension Inquiry Written
Apr 19, 2019
Lie Checked Susp - To Atty For Action
Apr 4, 2019
Assigned To Lie
Sep 19, 2018
Notification Of Letter Of Suspension E-Mailed
Sep 19, 2018
Letter Of Suspension E-Mailed
Sep 19, 2018
Suspension Letter Written
Aug 1, 2018
Teas/Email Correspondence Entered
Jul 31, 2018
Correspondence Received In Law Office
Jul 31, 2018
Teas Response To Office Action Received
Feb 1, 2018
Notification Of Non-Final Action E-Mailed
Feb 1, 2018
Non-Final Action E-Mailed
Feb 1, 2018
Non-Final Action Written
Feb 1, 2018
Applicant Amendment Prior To Examination - Entered
Jan 25, 2018
Teas Voluntary Amendment Received
Jan 13, 2018
Assigned To Examiner
Oct 12, 2017
New Application Office Supplied Data Entered In Tram
Oct 9, 2017
New Application Entered In Tram
Trademark Alertz updated from USPTO on 2030-01-24
