Trademark: 79360594
Word
LASERTEC
Status
Pending
Status Code
686
Status Date
Tuesday, February 20, 2024
Serial Number
79360594
Mark Type
4000
Filing Date
Wednesday, October 26, 2022
Published for Opposition
Tuesday, February 20, 2024

Trademark Owner History
Lasertec Corporation - Owner At Publication

Classifications
9 Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus
7 Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays
LASER TECH

Trademark Events
Mar 4, 2024
Official Gazette Publication Confirmation E-Mailed
Feb 26, 2024
Notification Processed By Ib
Feb 20, 2024
Published For Opposition
Feb 7, 2024
Notification Of Possible Opposition Sent To Ib
Feb 7, 2024
Notice Of Start Of Opposition Period Created, To Be Sent To Ib
Feb 3, 2024
New Representative At Ib Received
Feb 1, 2024
Notification Of Notice Of Publication E-Mailed
Feb 1, 2024
Notification Of Notice Of Publication E-Mailed
Jan 31, 2024
Official Gazette Publication Confirmation E-Mailed
Jan 17, 2024
Approved For Pub - Principal Register
Jan 2, 2024
Examiner's Amendment Entered
Jan 2, 2024
Notification Of Examiners Amendment E-Mailed
Jan 2, 2024
Examiners Amendment E-Mailed
Jan 2, 2024
Examiners Amendment -Written
Dec 8, 2023
Teas/Email Correspondence Entered
Dec 7, 2023
Correspondence Received In Law Office
Dec 7, 2023
Teas Response To Office Action Received
Jul 20, 2023
Teas Change Of Correspondence Received
Jul 20, 2023
Teas Change Of Domestic Representatives Address
Jul 20, 2023
Attorney/Dom.Rep.Revoked And/Or Appointed
Jul 20, 2023
Teas Revoke/App/Change Addr Of Atty/Dom Rep Received
Jul 20, 2023
Applicant/Correspondence Changes (Non-Responsive) Entered
Jul 20, 2023
Teas Change Of Owner Address Received
Jul 11, 2023
Refusal Processed By Ib
Jun 20, 2023
Non-Final Action Mailed - Refusal Sent To Ib
Jun 20, 2023
Refusal Processed By Mpu
May 11, 2023
Non-Final Action (Ib Refusal) Prepared For Review
May 10, 2023
Non-Final Action Written
May 9, 2023
Assigned To Examiner
Jan 28, 2023
Application Filing Receipt Mailed
Jan 24, 2023
New Application Office Supplied Data Entered
Jan 23, 2023
Limitation From Original Application Entered
Jan 19, 2023
Sn Assigned For Sect 66a Appl From Ib

Trademark Alertz updated from USPTO on 2030-01-24