Trademark: 79128106
Status Date
Wednesday, February 1, 2023
Registration Number
4508602
Registration Date
Tuesday, April 8, 2014
Filing Date
Friday, February 1, 2013
Published for Opposition
Tuesday, January 21, 2014
Cancellation Date
Wednesday, February 1, 2023
9 Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods
Aug 26, 2023
Notification Of Effect Of Cancellation Of Intl Reg E-Mailed
Aug 26, 2023
Death Of International Registration
Apr 8, 2023
Courtesy Reminder - Sec. 71 (10-Yr) E-Mailed
May 15, 2020
Notice Of Acceptance Of Sec. 71 & 15 - E-Mailed
May 15, 2020
Registered - Sec. 71 Accepted & Sec. 15 Ack.
May 13, 2020
Case Assigned To Post Registration Paralegal
Apr 9, 2020
Teas Section 71 & 15 Received
Apr 8, 2019
Courtesy Reminder - Sec. 71 (6-Yr) E-Mailed
Aug 8, 2014
Final Decision Transaction Processed By Ib
Jul 18, 2014
Final Disposition Notice Sent To Ib
Jul 18, 2014
Final Disposition Processed
Jul 8, 2014
Final Disposition Notice Created, To Be Sent To Ib
Apr 8, 2014
Registered-Principal Register
Jan 21, 2014
Official Gazette Publication Confirmation E-Mailed
Jan 21, 2014
Published For Opposition
Jan 16, 2014
Notification Processed By Ib
Jan 1, 2014
Notification Of Possible Opposition Sent To Ib
Jan 1, 2014
Notice Of Start Of Opposition Period Created, To Be Sent To Ib
Jan 1, 2014
Notification Of Notice Of Publication E-Mailed
Dec 13, 2013
Law Office Publication Review Completed
Dec 11, 2013
Approved For Pub - Principal Register
Nov 19, 2013
Teas/Email Correspondence Entered
Nov 19, 2013
Correspondence Received In Law Office
Nov 12, 2013
Assigned To Lie
Nov 8, 2013
Teas Response To Office Action Received
Oct 31, 2013
Attorney/Dom.Rep.Revoked And/Or Appointed
Oct 31, 2013
Teas Revoke/App/Change Addr Of Atty/Dom Rep Received
May 26, 2013
Refusal Processed By Ib
May 8, 2013
Non-Final Action Mailed - Refusal Sent To Ib
May 7, 2013
Refusal Processed By Mpu
May 7, 2013
Non-Final Action (Ib Refusal) Prepared For Review
May 6, 2013
Non-Final Action Written
May 6, 2013
Assigned To Examiner
Apr 27, 2013
Application Filing Receipt Mailed
Apr 23, 2013
New Application Office Supplied Data Entered
Apr 18, 2013
Sn Assigned For Sect 66a Appl From Ib
Trademark Alertz updated from USPTO on 2030-01-24
