Word

WONIK IPS

Status

Registered

Status Code

706

Status Date

Saturday, March 11, 2023

Serial Number

79103531

Registration Number

4204134

Registration Date

Tuesday, September 11, 2012

Mark Type

3000

Filing Date

Wednesday, March 16, 2011

Published for Opposition

Tuesday, June 26, 2012

Trademark Owner History

WONIK CORPORATION -
WONIK IPS CO., LTD -

Classifications

7 Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, ] low temperature annealing apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, coupled sputtering apparatus, ] multiple sputtering apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * laser sublimation deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * organic molecular chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam generation apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam sputter deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, ion beam etching apparatus, ] ion beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam crystallization apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, electron beam annealing apparatus, ] oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [ ; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electrocutions display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; micro electromechanical systems (ME MS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix light emitting diode (GAMBOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]

37 Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor Keita apparatus, liquid Keita apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors [ ; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and GAMBOLED displays ]

The mark consists of the stylized wording "WONIK" in blue, the stylized letters "IPS" in red, and a gray circular design inside the character "O".
In the statement, Page 1, line 8, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 8, through line 11, "ATOMIC LAYER DEPOSITION APPARATUS, ION BEAM DEPOSITION APPARATUS, ION BEAM ETCHING APPARATUS, ANNEALING APPARATUS, RAPID THERMAL PROCESSING APPARATUS, COUPLED SPUTTERING APPARATUS," should be deleted. In the statement, Page 1, line 11, through line 17, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 14, through line 15, "ION BEAM ETCHING APPARATUS," should be deleted. In the statement, Page 1, line 17, "ELECTRON BEAM ANNEALING APPARATUS," should be deleted.
The color(s) blue, red and gray is/are claimed as a feature of the mark.
The wording "WONIK" has no meaning in a foreign language.

Trademark Events

Dec 18, 2023

Partial Invalidation Processed By The Ib

Nov 16, 2023

Partial Invalidation Of Reg Ext Protection Sent To Ib

Nov 16, 2023

Invalidation Processed

Nov 11, 2023

Partial Invalidation Of Reg Ext Protection Created

Mar 11, 2023

Notice Of Acceptance Of Sec. 71 - E-Mailed

Mar 11, 2023

Registered-Sec.71 Accepted

Mar 11, 2023

Case Assigned To Post Registration Paralegal

Oct 7, 2022

Change Of Owner Received From Ib

Sep 8, 2022

Teas Section 71 Received

Sep 11, 2021

Courtesy Reminder - Sec. 71 (10-Yr) E-Mailed

Apr 30, 2021

International Registration Renewed

Dec 17, 2019

Invalidation Reviewed - No Action Required By Office

Nov 27, 2019

Partial Invalidation Of Reg Ext Protection Created

May 3, 2019

Partial Invalidation Processed By The Ib

Mar 27, 2019

Partial Invalidation Of Reg Ext Protection Sent To Ib

Mar 27, 2019

Invalidation Processed

Feb 22, 2019

Partial Invalidation Of Reg Ext Protection Created

Jun 22, 2018

Notice Of Acceptance Of Sec. 71 - E-Mailed

Jun 22, 2018

Registered-Sec.71 Accepted

May 11, 2018

Case Assigned To Post Registration Paralegal

Apr 30, 2018

Teas Section 71 Received

Nov 16, 2017

Limitation From The Ib Examined, No Action Is Needed

Oct 23, 2017

Correction From The Ib Examined, No Action Is Needed

Oct 23, 2017

Correction From The Ib Examined, No Action Is Needed

Oct 16, 2017

Correction From The Ib Examined, No Action Is Needed

Oct 13, 2017

Correction Transaction Received From Ib

Oct 13, 2017

Correction Transaction Received From Ib

Oct 13, 2017

Correction Transaction Received From Ib

Oct 13, 2017

Limitation Of Goods Received From Ib

Sep 11, 2017

Courtesy Reminder - Sec. 71 (6-Yr) E-Mailed

Jul 21, 2016

Change Of Owner Received From Ib

Jul 5, 2016

Invalidation Reviewed - No Action Required By Office

Jul 5, 2016

Partial Invalidation Of Reg Ext Protection Created

Nov 6, 2015

Limitation From The Ib Examined And Entered

Nov 5, 2015

Correction Under Section 7 ¿ Processed

Nov 5, 2015

Case Assigned To Post Registration Paralegal

Jul 31, 2015

Limitation Of Goods Received From Ib

Jan 7, 2013

Final Decision Transaction Processed By Ib

Dec 17, 2012

Final Disposition Notice Sent To Ib

Dec 17, 2012

Final Disposition Processed

Dec 11, 2012

Final Disposition Notice Created, To Be Sent To Ib

Dec 10, 2012

Notification Processed By Ib

Sep 11, 2012

Registered-Principal Register

Jun 26, 2012

Official Gazette Publication Confirmation E-Mailed

Jun 26, 2012

Published For Opposition

Jun 6, 2012

Notification Of Possible Opposition Sent To Ib

Jun 6, 2012

Notice Of Start Of Opposition Period Created, To Be Sent To Ib

Jun 6, 2012

Notification Of Notice Of Publication E-Mailed

May 21, 2012

Law Office Publication Review Completed

May 14, 2012

Approved For Pub - Principal Register

Apr 19, 2012

Teas/Email Correspondence Entered

Apr 19, 2012

Correspondence Received In Law Office

Apr 13, 2012

Assigned To Lie

Apr 3, 2012

Teas Response To Office Action Received

Apr 3, 2012

Teas Change Of Correspondence Received

Dec 30, 2011

Change Of Name/Address Rec'd From Ib

Dec 19, 2011

Refusal Processed By Ib

Nov 15, 2011

Non-Final Action Mailed - Refusal Sent To Ib

Nov 15, 2011

Refusal Processed By Mpu

Nov 15, 2011

Non-Final Action (Ib Refusal) Prepared For Review

Nov 14, 2011

Non-Final Action Written

Nov 14, 2011

Fax Received

Nov 8, 2011

Non-Final Action (Ib Refusal) Withdrawn For Review

Nov 5, 2011

Non-Final Action (Ib Refusal) Prepared For Review

Nov 4, 2011

Non-Final Action Written

Nov 1, 2011

Application Filing Receipt Mailed

Oct 28, 2011

Assigned To Examiner

Oct 28, 2011

New Application Office Supplied Data Entered

Oct 27, 2011

Sn Assigned For Sect 66a Appl From Ib