Word

WONIK IPS

Status

Dead

Status Code

404

Status Date

Wednesday, March 17, 2021

Serial Number

79102249

Registration Number

4204098

Registration Date

Tuesday, September 11, 2012

Mark Type

3000

Filing Date

Wednesday, March 16, 2011

Published for Opposition

Tuesday, June 26, 2012

Cancellation Date

Wednesday, March 17, 2021

Trademark Owner History

WONIK IPS CO., LTD -

Classifications

7 Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electroluminescence display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; microelectromechanical systems (MEMS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix organic light emitting diode (AMOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]

37 Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and AMOLED displays ]

The color(s) blue, red, gray and white is/are claimed as a feature of the mark.
The mark consists of the wording "WONIK IPS" and a circular blue, gray and white design feature to the left of the wording. The wording "WONIK" is in blue, with a circular gray and white design within the letter "O", and the wording "IPS" is in red.
The wording "WONIK" has no meaning in a foreign language.

Trademark Events

Oct 3, 2021

Notification Of Effect Of Cancellation Of Intl Reg E-Mailed

Oct 3, 2021

Death Of International Registration

Jul 3, 2020

Total Invalidation Processed By The Ib

Jun 4, 2020

Total Invalidation Of Reg Ext Protection Sent To Ib

Jun 4, 2020

Invalidation Processed

Apr 18, 2020

Total Invalidation Of Reg Ext Protection Created

Aug 20, 2019

Notice Of Cancellation Sec. 71 E-Mailed

Aug 18, 2019

Cancelled Section 71

Apr 16, 2019

Invalidation Reviewed - No Action Required By Office

Mar 31, 2019

Partial Invalidation Of Reg Ext Protection Created

Feb 11, 2019

Post Registration Action Mailed - Sec.71

Feb 7, 2019

Case Assigned To Post Registration Paralegal

Jan 31, 2019

Teas Response To Office Action-Post Reg Received

Jan 31, 2019

Teas Response To Office Action-Post Reg Received

Jul 31, 2018

Post Registration Action Mailed - Sec.71

May 8, 2018

Case Assigned To Post Registration Paralegal

Apr 27, 2018

Teas Section 71 Received

Oct 16, 2017

Correction From The Ib Examined, No Action Is Needed

Oct 13, 2017

Correction Transaction Received From Ib

Sep 11, 2017

Courtesy Reminder - Sec. 71 (6-Yr) E-Mailed

Jul 21, 2016

Change Of Owner Received From Ib

Aug 17, 2015

Limitation From The Ib Examined, No Action Is Needed

Jul 31, 2015

Limitation Of Goods Received From Ib

May 6, 2013

Final Decision Transaction Processed By Ib

Apr 16, 2013

Final Disposition Notice Sent To Ib

Apr 16, 2013

Final Disposition Processed

Dec 11, 2012

Final Disposition Notice Created, To Be Sent To Ib

Dec 2, 2012

Notification Processed By Ib

Sep 11, 2012

Registered-Principal Register

Jun 26, 2012

Official Gazette Publication Confirmation E-Mailed

Jun 26, 2012

Published For Opposition

Jun 6, 2012

Notification Of Possible Opposition Sent To Ib

Jun 6, 2012

Notice Of Start Of Opposition Period Created, To Be Sent To Ib

Jun 6, 2012

Notification Of Notice Of Publication E-Mailed

May 21, 2012

Law Office Publication Review Completed

May 11, 2012

Approved For Pub - Principal Register

May 11, 2012

Examiner's Amendment Entered

May 11, 2012

Notification Of Examiners Amendment E-Mailed

May 11, 2012

Examiners Amendment E-Mailed

May 11, 2012

Examiners Amendment -Written

Apr 19, 2012

Teas/Email Correspondence Entered

Apr 19, 2012

Correspondence Received In Law Office

Apr 6, 2012

Teas Change Of Correspondence Received

Apr 6, 2012

Teas Response To Office Action Received

Dec 30, 2011

Change Of Name/Address Rec'd From Ib

Oct 30, 2011

Refusal Processed By Ib

Oct 19, 2011

Applicant/Correspondence Changes (Non-Responsive) Entered

Oct 13, 2011

Assigned To Lie

Oct 12, 2011

Fax Received

Oct 11, 2011

Non-Final Action Mailed - Refusal Sent To Ib

Oct 11, 2011

Refusal Processed By Mpu

Oct 10, 2011

Non-Final Action (Ib Refusal) Prepared For Review

Oct 9, 2011

Non-Final Action Written

Oct 4, 2011

Application Filing Receipt Mailed

Sep 30, 2011

Assigned To Examiner

Sep 30, 2011

New Application Office Supplied Data Entered In Tram

Sep 29, 2011

Sn Assigned For Sect 66a Appl From Ib