Trademark: 79044455
Status Date
Thursday, August 31, 2017
Registration Number
3631493
Registration Date
Tuesday, June 2, 2009
Filing Date
Thursday, August 30, 2007
Published for Opposition
Tuesday, March 17, 2009
Cancellation Date
Thursday, August 31, 2017
7 Machine tools, namely, lathes, centrifuges, and grinders, all for use with plasma enhanced chemical vapor deposition (PECVD) machines, low pressure chemical vapor deposition (CVD) machines, chemical vapor deposition equipment and machines, rapid thermal process machines, rapid thermal anneal (RTA) machines, nano filtration equipment and machines, sputter equipment and machines, e-beam equipment and machines, evaporation machines, e-beam lithography machines, machines for the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon; machines for turning and grinding, namely, sputtering machines and centrifugal grinding machines; machines and machine tools for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires; nanomachines for process filtration in the pharmaceutical industry; plasma process apparatus, namely, plasma etching machines; turnkey equipment and installations, namely, starter alternators; electric motors, namely, electric motors for machines; oil filters; chucks for lathes and power drills; Machine tools, namely, filters, all for use with plasma enhanced chemical vapor deposition (PECVD) machines, low pressure chemical vapor deposition (CVD) machines, chemical vapor deposition machines, rapid thermal process machines, rapid thermal anneal (RTA) machines, nano filtration machines, sputter machines, e-beam machines, evaporation machines, e-beam lithography machines, machines for the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon
9 Computer software for the control of machines used in the production of carbon nanotubes, machines for the production of silicon, zinc oxide and tungsten nanowires, and machines for the production of graphene and diamond like carbon; computer software systems to enable research into the integration of carbon nanotubes (CNTs) technology into semiconductor devices, silicon nanowire growth for advanced silicon chip technologies, high performance solar cells, fuel cell technologies, and novel flat panel display coatings; computer software for the operation of machine tools, machines for turning and grinding, machines for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires, nanomachines, and plasma process apparatus; educational software featuring instruction in the operation of machine tools, machines for turning and grinding, machines for low-temperature precision growth of carbon nanotubes and silicon and tungsten oxide nanowires, nanomachines, and plasma process apparatus; computer hardware; software for ensuring processes are running according to specified parameters; software for calculating the required parameters to obtain the desired performance of machines; apparatus and devices for laboratory purposes and for use in the chemical industry and for establishing the properties of materials, namely, spectrometers, visible light spectrometers, infrared spectrometers, Raman spectrometers, x-ray inspection machines, ellipsometers; blank magnetic data carriers; pre-recorded magnetic data carriers featuring software for operation of machines that create structures in which at least one characteristic dimension is smaller than 1 micron; calculating machines, data processing equipment and computers; sputtering apparatus and instruments, namely, sputter devices used in further manufacture of goods by depositing material and substrates using a sputtering process
Mar 16, 2018
Notification Of Effect Of Cancellation Of Intl Reg Mailed
Mar 16, 2018
Death Of International Registration
Mar 31, 2017
Total Invalidation Processed By The Ib
Sep 8, 2016
Total Invalidation Of Reg Ext Protection Sent To Ib
Sep 8, 2016
Invalidation Processed
Sep 8, 2016
Total Invalidation Of Reg Ext Protection Created
Jan 8, 2016
Cancelled Section 71
Jan 12, 2013
Final Decision Transaction Processed By Ib
Sep 9, 2009
Final Disposition Notice Sent To Ib
Sep 9, 2009
Final Disposition Processed
Sep 2, 2009
Final Disposition Notice Created, To Be Sent To Ib
Jun 2, 2009
Registered-Principal Register
Apr 16, 2009
Notification Of Possible Opposition - Processed By Ib
Apr 2, 2009
Notification Of Possible Opposition Sent To Ib
Apr 2, 2009
Notification Of Possible Opposition Created, To Be Sent To Ib
Mar 17, 2009
Published For Opposition
Feb 25, 2009
Notice Of Publication
Feb 10, 2009
Law Office Publication Review Completed
Feb 10, 2009
Assigned To Lie
Jan 30, 2009
Approved For Pub - Principal Register
Jan 25, 2009
Examiner's Amendment Entered
Jan 25, 2009
Notification Of Examiners Amendment E-Mailed
Jan 25, 2009
Examiners Amendment E-Mailed
Jan 25, 2009
Examiners Amendment -Written
Dec 30, 2008
Ex Parte Appeal-Instituted
Dec 30, 2008
Jurisdiction Restored To Examining Attorney
Dec 30, 2008
Exparte Appeal Received At Ttab
Dec 30, 2008
Teas Request For Reconsideration Received
Dec 30, 2008
Teas Request For Reconsideration Received
Jul 2, 2008
Notification Of Final Refusal Emailed
Jul 2, 2008
Final Refusal E-Mailed
Jul 2, 2008
Final Refusal Written
Jun 10, 2008
Teas Change Of Correspondence Received
Jun 10, 2008
Teas/Email Correspondence Entered
Jun 10, 2008
Correspondence Received In Law Office
Jun 10, 2008
Teas Response To Office Action Received
Dec 29, 2007
Refusal Processed By Ib
Dec 11, 2007
Non-Final Action Mailed - Refusal Sent To Ib
Dec 11, 2007
Refusal Processed By Mpu
Dec 11, 2007
Non-Final Action (Ib Refusal) Prepared For Review
Dec 10, 2007
Non-Final Action Written
Dec 7, 2007
Assigned To Examiner
Nov 2, 2007
New Application Entered In Tram
Nov 1, 2007
Sn Assigned For Sect 66a Appl From Ib
Trademark Alertz updated from USPTO on 2030-01-24
