Trademark: 78148521
Word
OASIS CLEAN
Status
Dead
Status Code
710
Status Date
Friday, August 21, 2015
Serial Number
78148521
Registration Number
2919750
Registration Date
Tuesday, January 18, 2005
Mark Type
1000
Filing Date
Monday, July 29, 2002
Published for Opposition
Tuesday, December 9, 2003
Cancellation Date
Friday, August 21, 2015

Trademark Owner History
Applied Materials, Inc - Original Registrant

Classifications
9 Semiconductor wafer processing equipment, operational software, and components, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, measuring and monitoring tools, wafer cleaning systems, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
"CLEAN"

Trademark Events
Aug 21, 2015
Cancelled Sec. 8 (10-Yr)/Expired Section 9
Mar 20, 2011
Registered - Sec. 8 (6-Yr) Accepted & Sec. 15 Ack.
Jan 4, 2011
Registered - Sec. 8 (6-Yr) & Sec. 15 Filed
Mar 17, 2011
Case Assigned To Post Registration Paralegal
Jan 4, 2011
Paper Received
Jan 18, 2005
Registered-Principal Register
Nov 4, 2004
Law Office Registration Review Completed
Nov 4, 2004
Assigned To Lie
Oct 17, 2004
Allowed Principal Register - Sou Accepted
Oct 4, 2004
Assigned To Examiner
Oct 1, 2004
Statement Of Use Processing Complete
Sep 2, 2004
Use Amendment Filed
Aug 27, 2004
Extension 1 Granted
Aug 27, 2004
Extension 1 Filed
Sep 2, 2004
Paper Received
Aug 27, 2004
Teas Extension Received
Mar 2, 2004
Noa Mailed - Sou Required From Applicant
Dec 9, 2003
Published For Opposition
Nov 19, 2003
Notice Of Publication
Oct 13, 2003
Approved For Pub - Principal Register
Jul 1, 2003
Correspondence Received In Law Office
Jul 16, 2003
Case File In Ticrs
Jul 1, 2003
Paper Received
Jan 6, 2003
Non-Final Action Mailed
Dec 12, 2002
Assigned To Examiner

Trademark Alertz updated from USPTO on 2030-01-24