In the statement, line 11, "methyihexane" should be deleted, and "methylhexane" should be inserted in class 1.
The mark consists of a three-dimensional circle or sphere design formed by partial images of multiple overlapping translucent blue and green circles on a background. Two partial circles on the left forming the mark appear in the color blue. Two partial circles on the right forming the mark appear in the color green. The blue and green partial circles overlap in the middle of the circle or sphere design. The partial circles appear on a background which can be seen in the upper right portion of the mark. The background appearing with the partial circle is not a part of the mark since the mark is a cutout mark.
In the statement, all of the goods in Class 1 should be deleted and "Gases, not being fuels, for general industrial use, namely, 1,1,1,2-tetrafluoroethane, 1,1,1-trichloro-2,2,2-trifluoroethane, 1,1,1-trichloroethane, 1,1, 2,2-tetrachloroethane, 1,1,2-trichloro- 1,2,2-trifluoroethane, 1,1,2-trichloroethane, 1,1-dichloroethylene, 1,1difluoroethane, 1,2-dichlorotetrafluoroethane, 1,3-butadiene, 1-butene, 1-chloro-2-propanol, l-chloropropane, 1-hexene, l-octene, 1-pentene, 2,2,4-trimethylpentane, 2,3-dimethylbutane, 2,4-dimethylpentane, 2,5-dimethylthiophene, 2-ethylbutene-1, 2-hexene, 2-methylbutyraldehyde, 2-methyl-l-butene, 2-methyl-2-butene, 2-methylbutane, 2-methylhexane, 2-methylpentane, 2-methylthiophene, 2-pentene, 2-propanol, 3,3-dimethyl-1-butene, 3-methyl-1-butene, 3-methylpentane, 4-methyl-1-pentene, 4-vinylcyclohexene, carbon monoxide, carbon dioxide and nitrogen, ethanol in air, acetaldehyde, acetone, acetonitrile, acetylacetone, acetylene, acrolein, acrylonitrile, acrylonitrile, compressed air, allene, ammonia, antimony pentafluoride, argon, argon and carbon dioxide mixture, argon and helium mixture, argon and oxygen mixture, arsenic fluoride, arsenic pentafluoride, arsine, benzene, benzoic acid, benzyl-D7 chlonde, bis, 2-methoxyethyl adipate, boron trichloride, boron trifluoride, bromine pentafluoride, bromine trifluoride, bromochlorodifluoromethane, bromotrifluoroethylene, butadiene, butyl benzene, butyl mercaptan, butyl nitrate, calibration gas, carbon dioxide, carbon dioxide in argon and helium mixture, carbon disulfide, carbon monoxide, carbon monoxide in air, carbon monoxide in nitrogen, carbon tetrachloride, carbonyl fluoride, carbonyl sulfide, alpha-hydro-omega-hydroxy-poly(oxy-I, 2-ethanediyl), chlorine, chlorine trifluoride, multi component mixture containing volatile organics in trace quantities with balance gas nitrogen, chlorobenzene, chlorodifluoromethane, chloroform, chloroiodomethane, chloropentafluoroethane, chlorotrifluoromethane, cinnamaldehyde, cis-1,2-dichloroethylene, cis-2-butene, cis-2-pentene, cumene, cyanogen, cyanogen chloride, cyclohexane, cyclohexanone, cyclopentane, cyclopropane, deuterium, diborane, dibromomethane, dibutyl ether, dichlorodifluoromethane, dichloromethane, dichloromonofluoromethane, dichlorosilane, dichlorotetrafluoroethane, diethyl disulfide, diethyl telluride, difluorodibromomethane, difluoromonochloroethane, digermane, dimethyl ether, dimethyl sulfate, dimethyl sulfide, dimethyl sulfoxide, dimethylamine, dimethyl zinc, dipropyl ether, disilane, dodecane, 2-chloro-1-difluoromethoxy-1,1,2-trifluoroethane, ethane, ethanol, ethyl acetate, ethyl acetylene, ethyl acrylate, ethyl alcohol, ethyl benzene, ethyl chloride, ethyl cyclohexane, ethyl ether, ethyl formate, ethyl mercaptan, ethyl methyl sulfide, ethyl sulfide, ethylamine, ethylene, ethylene dichloride, ethylene glycol, ethylene glycol dimethyl ether, ethylene glycol monomethyl ether, ethylene oxide and nitrogen, ethyleneoxide, fluorine, trifluoromethane, fluorotrichloromethane, 2-chloro-2-difluoromethoxy-1,1,1-trifluoroethane, formaldehyde gas, furan, furfuryl alcohol, germanium tetrachloride, germanium tetrahydride, trichlorofluoromethane, chlorotrifluoroethylene, trichlorotrifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, hexafluoroethane, dichlorodifluoromethane, chlorotrifluoromethane, 1,1,1,2-tetrafluoroethane, bromotrifluoromethane, carbon tetrafluoride, monochlorodifluoromethane, trifluoromethane, octafluorocyclobutane, 1,1,1-trifluoro-2-chloro-2-bromoethane, helium, heptane, hexafluoroethane, hexafluoropropene, hexafluorpropylene, hydriodic acid, hydrogen, hydrogen bromide, hydrogen chloride, hydrogen cyanide, hydrogen fluoride, hydrogen selenide, hydrogen sulfide, hydrogen iodide, iodine pentafluoride, isobutane, isobutene, isobutyl alcohol, isobutyl nitrate, isobutylene, isohexene, isopentane, isoprene, isopropyl alcohol, isopropyl chloride, isopropyl ether, isopropyl mercaptan, krypton, methane, methane in argon, helium and nitrogen or air mixture, methane, methane and hydrogen gas mixture, methanol, methoxyflurane, methyl acetate, methyl acetylene, methyl acrylate, methyl alcohol, methyl bromide, methyl chloride, methyl chloroform, methyl disulfide, methyl ethyl ketone, methyl fluoride, methyl formate, methyl iodide, methyl isobutyl ketone, methyl mercaptan, methyl methacrylate, methyl propionate, methyl salicylate, methyl tert-butyl ether, methyl vinyl ketone, dimethoxymethane, methylamine, methylcyclopentane, methylene bromide, methylene fluoride, monomethylamine, m-xylene, n-amylamine, metal oxides and metal chlorides, metal oxides, metal bromides absorbed hydrogen bromide on compound, and hydrogen bromide vapor, metal oxides, metal chlorides, absorbed hydrogen chloride on compound, and hydrogen chloride vapor, organolithium polymer, lithium amide, and anhydrous ammonia, organolithium, sulfur hexafluoride, and lithium hydride, organolithium polymer and lithium hydride, metal oxides, naphthalene, n-butane, n-butyl acetate, n-butyl alcohol, n-butyl sulfide, n-butyraldehyde, n-decane, neohexane, neon, neopentane, n-heptane, n-hexane, nickel carbonyl, nitrogen, nitric oxide, nitric oxide and nitrogen mixture, nitric oxide and sulfur dioxide and nitrogen gas mixture, nitrogen dioxide, nitrogen trifluoride, nitrosyl chloride, nitrous oxide, n-octane, nonane, n-pentane, n-propyl acetate, n-propyl alcohol, octafluorocyclobutane, octafluorocyclopentene, octane, o-dichlorobenzene, oxides of nitrogen in nitrogen, oxygen in nitrogen, oxygen, compressed gas, oxygen and nitrogen gas mixture, o-xylene, pentane, perfluoro-2-butene, perfluoropropane, permanganate and alkali impregnated diatomaceous earth, phosgene, phosphine, phosphine pentafluoride, phosphorus pentafluoride, phosphorus trifluoride, piperidine, tetraethylene glycol dimethyl ether and sodium naphthalene complex, ethylene glycol dimethyl ether and sodium naphthalene complex, propane, propane in air, propane in nitrogen, propionaldehyde, propyl mercaptan, propylene, propylene oxide, p-xylene, pyridine, arsenic fluoride, arsine, boron trifluoride, germanium tetrafluoride, phosphine; silicon tetrafluoride, sec-butyl alcohol, silane, silicon tetrachloride, silicon tetrafluoride, sodium dichromate, sodium dispersion in mineral spirits, sodium dispersion in naphthalene, sodium dispersion in transformer oil, sodium metal dispersion in organic solvent, sodium metal, sodium methylate, sodium shot, styrene, styrene monomer, sulfur dioxide, sulfur dioxide in air, sulfur dioxide in nitrogen, sulfur dioxide and nitrogen mixture, sulfur hexafluoride, sulfur tetrafluoride, sulfuryl fluoride, tert-butyl chloride, tert-butyl mercaptan, tetrachloroethylene, tetraethylene glycol dimethyl ether, tetraethylorthosilicate, tetrafluoroethylene, tetrafluoromethane, tetrahydrofuran, tetrahydronaphthalene, thiophene, titanium tetrachloride, toluene, trans-1,2-dichloroethylene, trans-2-butene, trans-2-pentene, trans-3-hexene, trans-3-hexene, transition metal salt impregnated diatomaceous earth, trichloroethylene, trichlorosilane, triethyl phosphite, triethylene glycol, trifluorochloroethylene, trifluoromonobromomethane, trimethyl phosphite, trimethylamine, tungsten hexafluoride, undecane, valeraldehyde, vinyl acetate, vinyl bromide, vinyl chloride, vinyl fluoride, vinyl methyl ether, vinylidene chloride, vinylidene fluoride, xenon, zinc arsenide, enriched stable isotopes, stable isotope labeled compounds, and liquefied gases, namely, argon, carbon dioxide, nitrogen oxide, oxygen, o-dichlorobenzene and dissolved acetylene gas; biochemical products used for scientific research, namely, media in the nature of stable isotope labeling media used in microbiology and tissue cultures for scientific purposes" should be inserted. In the statement, all of the services in Class 37 should be deleted and "Repair or maintenance of optical communication machines and apparatus; repair or maintenance of medical optical machines and apparatus; repair or maintenance of loading and unloading machines and apparatus to distribute or control liquefied gas; repair or maintenance of fire and smoke alarms; furnace burner maintenance or repair; repair and maintenance of furnace, electrical and industrial boilers; pump repair or maintenance; repair or maintenance of freezers; repair or maintenance of electronic machines and apparatus in the nature of computer hardware; repair or maintenance of laboratory apparatus and instruments; repair or maintenance of measuring and testing machines and instruments, namely, space simulation chambers; repair or maintenance of medical machines and apparatus; repair or maintenance of chemical processing machines and apparatus; repair and maintenance of semiconductor manufacturing machines; repair or maintenance of freezing machines and apparatus; repair or maintenance of storage tanks; repair or maintenance of water purifying apparatus; repair or maintenance of waste compacting machines and apparatus; repair or maintenance of waste crushing machines and apparatus and bacterial sterilization and disinfection machines and apparatus all for medical use; rental of construction machines and apparatus; repair or maintenance of chemical vapor deposition (CVD) thin-filmed equipment and apparatus for processed glass surfaces; repair or maintenance of chemical vapor deposition (CVD) thin-filmed equipment and apparatus for processed metal surfaces; repair or maintenance of chemical vapor deposition (CVD) thinfilmed equipment and apparatus for processed plastic surfaces; repair and maintenance of exhaust gas treatment equipment for semiconductor manufacturing machines" should be inserted.
The color(s) blue and green is/are claimed as a feature of the mark.
Trademark: 76624545
