Trademark: 76598222
Word
REFLEXION LK ECMP
Status Date
Monday, January 19, 2009
Filing Date
Monday, June 21, 2004
Published for Opposition
Tuesday, September 27, 2005
Abandoned Date
Monday, January 19, 2009
9 Equipment and machines for the processing, production, polishing and cleaning of semiconductor substrates, thin films, silicon discs and wafers; namely, chemical mechanical polishers, cleaners, and dryers
Color is not claimed as a feature of the mark.
"ECMP"
REFLECTIO LK EQUIPMENT CHEMICAL MECHANICAL POLISHING
Jan 21, 2009
Abandonment Notice Mailed - No Use Statement Filed
Jan 19, 2009
Abandonment - No Use Statement Filed
Jun 16, 2008
Extension 5 Granted
Jun 11, 2008
Extension 5 Filed
Jun 11, 2008
Teas Extension Received
Jan 11, 2008
Extension 4 Granted
Dec 13, 2007
Extension 4 Filed
Dec 13, 2007
Teas Extension Received
Sep 5, 2007
Extension 3 Granted
Jun 13, 2007
Extension 3 Filed
Jun 13, 2007
Teas Extension Received
Feb 23, 2007
Extension 2 Granted
Dec 12, 2006
Extension 2 Filed
Dec 12, 2006
Teas Extension Received
Jul 12, 2006
Extension 1 Granted
Jun 15, 2006
Extension 1 Filed
Jun 15, 2006
Teas Extension Received
Dec 20, 2005
Noa Mailed - Sou Required From Applicant
Sep 27, 2005
Published For Opposition
Sep 7, 2005
Notice Of Publication
Jun 1, 2005
Law Office Publication Review Completed
May 27, 2005
Assigned To Lie
May 24, 2005
Examiners Amendment Mailed
May 24, 2005
Approved For Pub - Principal Register
May 24, 2005
Examiners Amendment -Written
May 18, 2005
Amendment From Applicant Entered
May 12, 2005
Correspondence Received In Law Office
May 12, 2005
Paper Received
Jan 25, 2005
Non-Final Action Mailed
Jan 25, 2005
Non-Final Action Written
Jan 25, 2005
Assigned To Examiner
Jul 1, 2004
New Application Entered In Tram
Trademark Alertz updated from USPTO on 2030-01-24
