11 Plants and equipment for thermal processing or manufacturing methods, namely, diffusion furnaces, continuous furnaces, burn in kilns, vacuum soldering furnaces, coating furnaces, annealing furnaces, enameling furnaces, vacuum furnaces, plants for chemical vapor deposition (CVD-plants); systems for processing of semiconductor wafers in vacuum, namely diffusion furnaces, plants for chemical vapor deposition; systems for handling and cleaning of gases and exhaust gases, namely, gas purification plants