Trademark: 76417720
Word
ADVANCED PATTERNING FILM
Status Date
Saturday, September 29, 2007
Filing Date
Wednesday, June 5, 2002
Published for Opposition
Tuesday, July 6, 2004
Abandoned Date
Saturday, September 29, 2007
9 Semiconductor wafer processing equipment, operational software, and components, namely epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
17 Insulating films for use in the manufacture of semiconductors
Jan 15, 2008
Abandonment Notice Mailed - No Use Statement Filed
Jan 15, 2008
Abandonment - No Use Statement Filed
Jun 28, 2007
Extension 5 Granted
Mar 19, 2007
Extension 5 Filed
Mar 19, 2007
Teas Extension Received
Oct 18, 2006
Extension 4 Granted
Sep 11, 2006
Extension 4 Filed
Sep 11, 2006
Paper Received
Mar 17, 2006
Extension 3 Granted
Mar 1, 2006
Extension 3 Filed
Mar 1, 2006
Teas Extension Received
Sep 12, 2005
Extension 2 Granted
Sep 6, 2005
Extension 2 Filed
Sep 6, 2005
Teas Extension Received
Mar 10, 2005
Extension 1 Granted
Mar 10, 2005
Extension 1 Filed
Mar 10, 2005
Teas Extension Received
Sep 28, 2004
Noa Mailed - Sou Required From Applicant
Jul 6, 2004
Published For Opposition
Jun 16, 2004
Notice Of Publication
Apr 20, 2004
Approved For Pub - Principal Register
Apr 14, 2004
Examiners Amendment Mailed
Mar 2, 2004
Exparte Appeal Terminated
Mar 2, 2004
Jurisdiction Restored To Examining Attorney
Mar 1, 2004
Ex Parte Appeal-Instituted
Feb 5, 2004
Exparte Appeal Received At Ttab
Dec 30, 2003
Abandonment - Failure To Respond Or Late Response
May 14, 2003
Final Refusal Mailed
Mar 13, 2003
Correspondence Received In Law Office
Mar 13, 2003
Paper Received
Sep 25, 2002
Non-Final Action Mailed
Sep 20, 2002
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
