Word

FATHOM

Status

Dead

Status Code

710

Status Date

Friday, August 27, 2010

Serial Number

76347903

Registration Number

2807148

Registration Date

Tuesday, January 20, 2004

Mark Type

1000

Filing Date

Tuesday, December 11, 2001

Published for Opposition

Tuesday, January 14, 2003

Cancellation Date

Friday, August 27, 2010

Trademark Owner History

NLINE CORPORATION - Original Registrant

Classifications

9 Inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes, for use in the manufacturing and testing of semiconductors

37 Installation, maintenance and repair of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes

40 Custom manufacture of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes

42 On-site and off-site inspection services for the semiconductor industry, namely wafer inspection, reticle inspection, defect detection, defect review, defect classification, nanotopography measurement, wafer flatness measurement, surface profiling, film thickness measurement, critical dimension measurement, and microscopy; and leasing and consultation of inspection and test equipment for the semiconductor industry, namely wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes; design of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes

Trademark Events

Aug 27, 2010

Cancelled Sec. 8 (6-Yr)

Jan 20, 2004

Registered-Principal Register

Nov 26, 2003

Allowed Principal Register - Sou Accepted

Nov 24, 2003

Assigned To Examiner

Nov 21, 2003

Case File In Ticrs

Nov 10, 2003

Statement Of Use Processing Complete

Nov 6, 2003

Extension 1 Granted

Oct 6, 2003

Use Amendment Filed

Oct 6, 2003

Extension 1 Filed

Oct 6, 2003

Paper Received

Apr 8, 2003

Noa Mailed - Sou Required From Applicant

Jan 14, 2003

Published For Opposition

Dec 25, 2002

Notice Of Publication

Nov 14, 2002

Approved For Pub - Principal Register

Nov 6, 2002

Examiners Amendment Mailed

Sep 24, 2002

Correspondence Received In Law Office

Sep 24, 2002

Paper Received

Mar 27, 2002

Non-Final Action Mailed

Mar 13, 2002

Assigned To Examiner