Trademark: 76335851
Status Date
Friday, September 10, 2010
Registration Number
2811261
Registration Date
Tuesday, February 3, 2004
Filing Date
Thursday, November 8, 2001
Published for Opposition
Tuesday, July 29, 2003
Cancellation Date
Friday, September 10, 2010
7 metal organic chemical vapor deposition reactor and gas distribution system comprising a water-cooled reaction chamber, gas injection flange, high temperature heating system, high vacuum loadlock chamber, alkyl and hydride injection manifolds and flow distribution tubing in the nature of production platforms for use in the manufacture of gallium nitride-based laser diodes
Sep 10, 2010
Cancelled Sec. 8 (6-Yr)
Apr 3, 2008
Attorney Revoked And/Or Appointed
Apr 3, 2008
Teas Revoke/Appoint Attorney Received
Feb 3, 2004
Registered-Principal Register
Dec 8, 2003
Allowed Principal Register - Sou Accepted
Dec 3, 2003
Statement Of Use Processing Complete
Nov 3, 2003
Use Amendment Filed
Nov 3, 2003
Paper Received
Oct 21, 2003
Noa Mailed - Sou Required From Applicant
Jul 29, 2003
Published For Opposition
Jul 9, 2003
Notice Of Publication
Jun 7, 2003
Approved For Pub - Principal Register
Mar 27, 2003
Correspondence Received In Law Office
May 27, 2003
Case File In Ticrs
May 27, 2003
Case File In Ticrs
Mar 31, 2003
Paper Received
Oct 22, 2002
Assigned To Examiner
Sep 30, 2002
Non-Final Action Mailed
Jun 18, 2002
Correspondence Received In Law Office
Feb 5, 2002
Non-Final Action Mailed
Jan 25, 2002
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
