Trademark: 76249601
Status Date
Tuesday, June 24, 2003
Filing Date
Tuesday, May 1, 2001
Abandoned Date
Tuesday, June 24, 2003
9 Plasma generating equipment and machines for the processing and production of semiconductor substrates, thin films, silicon discs and wafers; namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers
Jun 24, 2003
Abandonment - After Ex Parte Appeal
Mar 2, 2004
Case File In Ticrs
Feb 25, 2004
Exparte Appeal Terminated
Feb 25, 2004
Exparte Appeal Terminated
Nov 17, 2003
Exparte Appeal Received At Ttab
Jun 24, 2003
Ex Parte Appeal-Refusal Affirmed
Apr 17, 2003
Examiners Statement Mailed
Feb 26, 2003
Jurisdiction Restored To Examining Attorney
Dec 23, 2002
Continuation Of Final Refusal Mailed
Dec 20, 2002
Assigned To Examiner
Dec 16, 2002
Jurisdiction Restored To Examining Attorney
Dec 16, 2002
Ex Parte Appeal-Instituted
Dec 11, 2002
Exparte Appeal Received At Ttab
Jun 13, 2002
Final Refusal Mailed
Feb 12, 2002
Correspondence Received In Law Office
Aug 14, 2001
Non-Final Action Mailed
Aug 7, 2001
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
