Trademark: 76225858
Word
ILB
Status Date
Tuesday, February 8, 2005
Filing Date
Wednesday, March 14, 2001
Published for Opposition
Tuesday, September 24, 2002
Abandoned Date
Thursday, January 13, 2005
9 Equipment and machines, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, and ion implanters for the processing and production of semiconductor substrates, thin films, silicon chips and wafers including polishing, cleaning and process monitoring equipment
Feb 8, 2005
Abandonment Notice Mailed - Failure To Respond
Feb 8, 2005
Abandonment - Failure To Respond Or Late Response
Jul 12, 2004
Non-Final Action Mailed
Jun 16, 2004
Statement Of Use Processing Complete
Jun 1, 2004
Use Amendment Filed
Jun 11, 2004
Case File In Ticrs
Jun 1, 2004
Paper Received
Apr 26, 2004
Assigned To Examiner
Dec 29, 2003
Extension 2 Granted
Dec 11, 2003
Extension 2 Filed
Dec 11, 2003
Teas Extension Received
Jun 24, 2003
Extension 1 Granted
Jun 12, 2003
Extension 1 Filed
Jun 11, 2003
Teas Extension Received
Dec 17, 2002
Noa Mailed - Sou Required From Applicant
Sep 24, 2002
Published For Opposition
Sep 4, 2002
Notice Of Publication
Jun 11, 2002
Approved For Pub - Principal Register
Jan 11, 2002
Correspondence Received In Law Office
Jul 18, 2001
Non-Final Action Mailed
Jul 9, 2001
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
