Word

NLINE

Status

Dead

Status Code

710

Status Date

Friday, September 9, 2011

Serial Number

76182067

Registration Number

2925556

Registration Date

Tuesday, February 8, 2005

Mark Type

1000

Filing Date

Thursday, December 14, 2000

Published for Opposition

Tuesday, October 22, 2002

Cancellation Date

Friday, September 9, 2011

Trademark Owner History

nLine Corporation - Original Registrant

Classifications

9 Inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes, for use in the manufacturing and testing of semiconductors

37 Installation, maintenance and repair of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes

40 Custom manufacture and design of inspection and test equipment for the semiconductor industry, namely, wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes

42 On-site and off-site inspection services for the semiconductor industry, namely wafer inspection, reticle inspection, defect detection, defect review, defect classification, nanotopography measurement, wafer flatness measurement, surface profiling, film thickness measurement, critical dimension measurement, and microscopy; and leasing and consultation of inspection and test equipment for the semiconductor industry, namely wafer inspection equipment, reticle inspection equipment, defect detection equipment, defect review equipment, defect classification equipment, nanotopography measurement equipment, wafer flatness measurement equipment, surface profiling equipment, film thickness measurement equipment, critical dimension measurement equipment, and microscopes

Trademark Events

Sep 9, 2011

Cancelled Sec. 8 (6-Yr)

Feb 8, 2005

Registered-Principal Register

Dec 10, 2004

Law Office Registration Review Completed

Dec 6, 2004

Assigned To Lie

Nov 28, 2004

Allowed Principal Register - Sou Accepted

Nov 8, 2004

Statement Of Use Processing Complete

Oct 15, 2004

Use Amendment Filed

Oct 15, 2004

Paper Received

Aug 31, 2004

Case File In Ticrs

May 11, 2004

Fax Received

May 4, 2004

Noa Mailed - Sou Required From Applicant

Oct 22, 2002

Published For Opposition

Oct 2, 2002

Notice Of Publication

Jul 18, 2002

Approved For Pub - Principal Register

Jul 5, 2002

Assigned To Examiner

Mar 5, 2002

Correspondence Received In Law Office

Mar 25, 2002

Correspondence Received In Law Office

Mar 25, 2002

Paper Received

Sep 24, 2001

Final Refusal Mailed

Jun 11, 2001

Correspondence Received In Law Office

Mar 22, 2001

Non-Final Action Mailed

Mar 20, 2001

Assigned To Examiner