1 Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, cesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafnium, holmium, indium, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, osmium, palladium, phosphorous, platinum, praseodymium, rhenium, rhodium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, sulphur, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc, zirconium, borides, carbides, fluorides, nitrides, oxides, silicides, selenides, sulphides, tellurides, ammonium compounds, alloys, metal alloys, compounds of aluminum, antimony, arsenic, barium, beryllium, bismuth, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafniurn, holmium, indium, iodine, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, mercury, molybdenum, neodymium, nickel, niobium, palladium, phosphorous, platinum, potassium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium, polymers for use as sputtering targets, acrylonitrile butadiene styrene, chlorinated polyvinyl chloride, chlorotrifluoro-ethylene, polyethylene, polyetheretherketone, polyethylene teraphthalate, polyethylene teraphthalate modified with cyclohexane dimethanol, polyvinyl chloride, polyvinylidene fluoride, polytetrafluoroethylene and polyamide, silicon monoxide, filaments of tungsten;[ photographic chemicals; fluids for hydraulic circuits and vacuum pumps; fluids for use with abrasives used in the scientific examination of samples by electron-microscopy, laboratory analysis processes, precision cutting, grinding and polishing of metallics, glasses and ceramic components used in the aerospace, automotive, capacitor, electrical resistor and electro-optical, electro-medical, magnetic, micro-electronic, optical and sensor industries; high vacuum fluids for use in pumps specific to the high vacuum industry, namely, mechanical and vapor diffusion pumps;] high purity chemicals for use in thin vapor deposition CVD in atmospheric pressure, high vacuum and ultra vacuum processing applications for the manufacture of computers, microprocessors, flat bed display screens, magnetic recording heads, semi-conductor devices and super-conductive devices, electrical components, namely, resistors, capacitors, and cathode-ray tubes, vacuum distillation and freeze drying of foodstuffs, metallurgy, pharmaceutical, and optical industries; adhesives used in manufacturing, namely, high vacuum adhesives and ultra-high vacuum sealing adhesives, low-temperature waxes for mounting optical components during polishing processes, and silver epoxy resins for bonding sputtering targets to sputtering sources
Trademark: 76177386
