Trademark: 75806687
Status Date
Sunday, April 25, 2004
Filing Date
Wednesday, September 22, 1999
Published for Opposition
Tuesday, January 30, 2001
Abandoned Date
Sunday, April 25, 2004
7 Semiconductor wafer processing equipment and components, namely, - epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
Jun 23, 2004
Abandonment - No Use Statement Filed
Oct 31, 2003
Extension 5 Granted
Oct 20, 2003
Extension 5 Filed
Oct 20, 2003
Teas Extension Received
May 13, 2003
Extension 4 Granted
Mar 25, 2003
Extension 4 Filed
Mar 25, 2003
Teas Extension Received
Oct 28, 2002
Extension 3 Granted
Sep 30, 2002
Extension 3 Filed
Sep 30, 2002
Teas Extension Received
Jul 11, 2002
Extension 2 Granted
Apr 4, 2002
Extension 2 Filed
Apr 4, 2002
Paper Received
Oct 16, 2001
Extension 1 Granted
Sep 29, 2001
Extension 1 Filed
Apr 24, 2001
Noa Mailed - Sou Required From Applicant
Jan 30, 2001
Published For Opposition
Dec 29, 2000
Notice Of Publication
Nov 16, 2000
Approved For Pub - Principal Register
Nov 8, 2000
Examiner's Amendment Mailed
Nov 7, 2000
Examiner's Amendment Mailed
Nov 4, 2000
Previous Allowance Count Withdrawn
Oct 10, 2000
Approved For Pub - Principal Register
Aug 29, 2000
Correspondence Received In Law Office
Mar 6, 2000
Non-Final Action Mailed
Feb 14, 2000
Assigned To Examiner
Feb 11, 2000
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
