Trademark: 75511814
Word
VERSALOCK PHOTOMASK ETCHER III
Status Date
Friday, September 29, 2000
Filing Date
Wednesday, July 1, 1998
Published for Opposition
Tuesday, January 4, 2000
Abandoned Date
Friday, September 29, 2000
7 plasma etching and plasma deposition machines used in the fabrication of semiconductor devices and in the fabrication of related electronic components
Jan 20, 2001
Abandonment - No Use Statement Filed
Mar 28, 2000
Noa Mailed - Sou Required From Applicant
Jan 4, 2000
Published For Opposition
Dec 3, 1999
Notice Of Publication
Oct 4, 1999
Approved For Pub - Principal Register
Sep 23, 1999
Examiner's Amendment Mailed
Mar 30, 1999
Non-Final Action Mailed
Mar 23, 1999
Assigned To Examiner
Mar 19, 1999
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24