Trademark: 75499297
Word
VERSALOCK PHOTOMASK ETCHER
Status Date
Wednesday, March 21, 2001
Filing Date
Wednesday, June 10, 1998
Published for Opposition
Tuesday, January 4, 2000
Abandoned Date
Friday, January 12, 2001
7 plasma etching and plasma deposition machines used in the fabrication of semiconductor devices and in the fabrication of related electronic components
"PHOTOMASK ETCHER"
VERSA LOCK PHOTO MASK ETCHER
Mar 21, 2001
Abandonment - Failure To Respond Or Late Response
Jul 12, 2000
Non-Final Action Mailed
Jun 19, 2000
Assigned To Examiner
Jun 14, 2000
Statement Of Use Processing Complete
Apr 21, 2000
Use Amendment Filed
Mar 28, 2000
Noa Mailed - Sou Required From Applicant
Jan 4, 2000
Published For Opposition
Dec 3, 1999
Notice Of Publication
Oct 4, 1999
Approved For Pub - Principal Register
Sep 23, 1999
Examiner's Amendment Mailed
Mar 22, 1999
Non-Final Action Mailed
Feb 23, 1999
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24