Trademark: 75408197
Word
POSEIDON STT
Status
Dead
Status Code
710
Status Date
Saturday, December 10, 2005
Serial Number
75408197
Registration Number
2228092
Registration Date
Tuesday, March 2, 1999
Mark Type
5S05
Filing Date
Thursday, December 18, 1997
Published for Opposition
Tuesday, December 8, 1998
Cancellation Date
Saturday, December 10, 2005

Trademark Owner History
Steag Micro Tech GmbH - Original Registrant

Classifications
7 machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts
11 drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
37 Installation and servicing of the following machines and units - machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and/or solar cells; machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
In the statement, Column 1, line 3, should be deleted, and, "Carl-Benz-Strasse 10" should be inserted.
"STT"

Trademark Events
Dec 10, 2005
Cancelled Sec. 8 (6-Yr)
Jan 27, 2000
Certificate Of Correction Issued
Jun 15, 1999
Sec 7 Request Filed
Mar 2, 1999
Registered-Principal Register
Dec 8, 1998
Published For Opposition
Nov 6, 1998
Notice Of Publication
Sep 13, 1998
Approved For Pub - Principal Register
Sep 11, 1998
Assigned To Examiner
Jul 27, 1998
Correspondence Received In Law Office
Mar 13, 1998
Sec. 1(B) Claim Deleted
Mar 13, 1998
Non-Final Action Mailed
Mar 10, 1998
Assigned To Examiner
Feb 13, 1998
Correspondence Received In Law Office

Trademark Alertz updated from USPTO on 2030-01-24