Trademark: 75354629
Status Date
Tuesday, December 18, 2018
Registration Number
2195771
Registration Date
Tuesday, October 13, 1998
Filing Date
Wednesday, September 10, 1997
Published for Opposition
Tuesday, July 21, 1998
1 chemical compositions for removal of photoresist and post etch residues in the manufacture of semiconductors and related products
Jul 3, 2019
Automatic Update Of Assignment Of Ownership
Dec 18, 2018
Notice Of Acceptance Of Sec. 8 & 9 - E-Mailed
Dec 18, 2018
Registered And Renewed (Second Renewal - 10 Yrs)
Dec 18, 2018
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Dec 12, 2018
Teas Response To Office Action-Post Reg Received
Nov 14, 2018
Post Registration Action Mailed - Sec. 8 & 9
Oct 25, 2018
Case Assigned To Post Registration Paralegal
Oct 15, 2018
Teas Section 8 & 9 Received
Oct 15, 2018
Teas Change Of Correspondence Received
Oct 13, 2017
Courtesy Reminder - Sec. 8 (10-Yr)/Sec. 9 E-Mailed
Dec 23, 2008
Registered And Renewed (First Renewal - 10 Yrs)
Dec 23, 2008
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Nov 26, 2008
Assigned To Paralegal
Nov 18, 2008
Teas Section 8 & 9 Received
Jul 27, 2007
Case File In Ticrs
Sep 27, 2005
Teas Change Of Correspondence Received
Jan 18, 2005
Registered - Sec. 8 (6-Yr) Accepted & Sec. 15 Ack.
Sep 24, 2004
Registered - Sec. 8 (6-Yr) & Sec. 15 Filed
Sep 24, 2004
Teas Section 8 & 15 Received
Oct 13, 1998
Registered-Principal Register
Jul 21, 1998
Published For Opposition
Jun 19, 1998
Notice Of Publication
May 9, 1998
Approved For Pub - Principal Register
Apr 22, 1998
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
