Trademark: 75005637
Status Date
Thursday, December 4, 1997
Filing Date
Friday, October 13, 1995
Published for Opposition
Tuesday, September 10, 1996
Abandoned Date
Thursday, December 4, 1997
9 semiconductor wafer processing equipment, namely a reactor utilizing microwaves and reactive ion etch plasma modes for removing organic photoresist and then removing ash and residue with gas phase processing from silicon wafers
Dec 4, 1997
Abandonment - No Use Statement Filed
Jun 24, 1997
Extension 1 Granted
May 30, 1997
Extension 1 Filed
Dec 3, 1996
Noa Mailed - Sou Required From Applicant
Sep 10, 1996
Published For Opposition
Aug 9, 1996
Notice Of Publication
Jul 2, 1996
Approved For Pub - Principal Register
Jun 26, 1996
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24