Trademark: 74591288
Status Date
Friday, September 26, 1997
Filing Date
Thursday, October 27, 1994
Published for Opposition
Tuesday, February 27, 1996
Abandoned Date
Saturday, August 9, 1997
1 chemical compositions for removal of photoresist and post etch residues in the manufacture of semiconductors and related products
Sep 26, 1997
Abandonment - Failure To Respond Or Late Response
Feb 7, 1997
Non-Final Action Mailed
Jan 30, 1997
Statement Of Use Processing Complete
Nov 4, 1996
Use Amendment Filed
Dec 22, 1996
Extension 1 Granted
Nov 4, 1996
Extension 1 Filed
May 21, 1996
Noa Mailed - Sou Required From Applicant
Feb 27, 1996
Published For Opposition
Jan 26, 1996
Notice Of Publication
Dec 11, 1995
Approved For Pub - Principal Register
Dec 4, 1995
Examiner's Amendment Mailed
Sep 22, 1995
Correspondence Received In Law Office
Mar 22, 1995
Non-Final Action Mailed
Mar 9, 1995
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24