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Trademark: 74572276
Word
HRE-
Status Date
Monday, December 4, 1995
Filing Date
Monday, September 12, 1994
Abandoned Date
Thursday, September 21, 1995
9 high density reflected electron plasma reactor used to etch materials for the manufacture of semiconductor devices
Dec 4, 1995
Abandonment - Failure To Respond Or Late Response
Mar 20, 1995
Non-Final Action Mailed
Feb 15, 1995
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24