Trademark: 74254474
Status Date
Tuesday, January 24, 2023
Registration Number
1732723
Registration Date
Tuesday, November 17, 1992
Filing Date
Wednesday, March 11, 1992
Published for Opposition
Tuesday, August 25, 1992
9 semiconductor manufacturing apparatus;, namely, diffusion/oxidation furnace, low pressure chemical vapor deposition apparatus [ and magnetron reactive ion etching apparatus ]
Jan 24, 2023
Notice Of Acceptance Of Sec. 8 & 9 - E-Mailed
Jan 24, 2023
Registered And Renewed (Third Renewal - 10 Yrs)
Jan 24, 2023
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Jan 24, 2023
Case Assigned To Post Registration Paralegal
Jul 8, 2022
Teas Section 8 & 9 Received
Nov 17, 2021
Courtesy Reminder - Sec. 8 (10-Yr)/Sec. 9 E-Mailed
Sep 19, 2018
Automatic Update Of Assignment Of Ownership
Aug 17, 2017
Teas Change Of Correspondence Received
Jul 18, 2012
Notice Of Acceptance Of Sec. 8 & 9 - E-Mailed
Jul 18, 2012
Registered And Renewed (Second Renewal - 10 Yrs)
Jul 18, 2012
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Jul 13, 2012
Teas Section 8 & 9 Received
Apr 11, 2008
Case File In Ticrs
Sep 28, 2002
Registered And Renewed (First Renewal - 10 Yrs)
Sep 28, 2002
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Jul 10, 2002
Registered - Combined Section 8 (10-Yr) & Sec. 9 Filed
Jul 10, 2002
Paper Received
Apr 1, 1999
Registered - Sec. 8 (6-Yr) Accepted & Sec. 15 Ack.
Nov 13, 1998
Registered - Sec. 8 (6-Yr) & Sec. 15 Filed
Nov 17, 1992
Registered-Principal Register
Aug 25, 1992
Published For Opposition
Jul 24, 1992
Notice Of Publication
Jun 11, 1992
Approved For Pub - Principal Register
Jun 6, 1992
Examiner's Amendment Mailed
May 20, 1992
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
