Trademark: 74210147
Status Date
Thursday, August 3, 2023
Registration Number
1704729
Registration Date
Tuesday, August 4, 1992
Filing Date
Monday, October 7, 1991
Published for Opposition
Tuesday, May 12, 1992
9 semiconductor wafer processing equipment; namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, and ion implanters
Aug 3, 2023
Notice Of Acceptance Of Sec. 8 & 9 - E-Mailed
Aug 3, 2023
Registered And Renewed (Third Renewal - 10 Yrs)
Aug 3, 2023
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Aug 3, 2023
Case Assigned To Post Registration Paralegal
Jan 16, 2023
Teas Section 8 & 9 Received
Apr 17, 2012
Notice Of Acceptance Of Sec. 8 & 9 - Mailed
Apr 17, 2012
Registered And Renewed (Second Renewal - 10 Yrs)
Apr 17, 2012
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Apr 13, 2012
Teas Section 8 & 9 Received
Feb 8, 2008
Case File In Ticrs
Nov 9, 2002
Registered And Renewed (First Renewal - 10 Yrs)
Nov 9, 2002
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Aug 22, 2002
Registered - Combined Section 8 (10-Yr) & Sec. 9 Filed
Aug 2, 2002
Paper Received
Feb 7, 1999
Registered - Sec. 8 (6-Yr) Accepted & Sec. 15 Ack.
Dec 9, 1998
Response Received To Post Reg. Action
Dec 9, 1998
Response Received To Post Reg. Action
Nov 4, 1998
Post Registration Action Mailed - Sec. 8 & 15
Aug 3, 1998
Registered - Sec. 8 (6-Yr) & Sec. 15 Filed
Aug 4, 1992
Registered-Principal Register
May 12, 1992
Published For Opposition
Apr 10, 1992
Notice Of Publication
Dec 19, 1991
Approved For Pub - Principal Register
Dec 10, 1991
Examiner's Amendment Mailed
Dec 6, 1991
Assigned To Examiner
Trademark Alertz updated from USPTO on 2030-01-24
