Trademark: 73337413
Status Date
Friday, January 27, 2023
Registration Number
1211425
Registration Date
Tuesday, October 5, 1982
Filing Date
Monday, November 16, 1981
Published for Opposition
Tuesday, July 13, 1982
9 Apparatus for Detecting Contaminants in Plasma Chemistry and Vacuum Environments, Said Plasma Processing Used in Etching and Deposition in the Manufacture of Semiconductor Devices
Jan 27, 2023
Notice Of Acceptance Of Sec. 8 & 9 - E-Mailed
Jan 27, 2023
Registered And Renewed (Third Renewal - 10 Yrs)
Jan 27, 2023
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Jan 27, 2023
Case Assigned To Post Registration Paralegal
Jul 13, 2022
Teas Section 8 & 9 Received
Oct 5, 2021
Courtesy Reminder - Sec. 8 (10-Yr)/Sec. 9 E-Mailed
Sep 28, 2012
Notice Of Acceptance Of Sec. 8 & 9 - E-Mailed
Sep 28, 2012
Registered And Renewed (Second Renewal - 10 Yrs)
Sep 28, 2012
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Sep 28, 2012
Case Assigned To Post Registration Paralegal
Sep 13, 2012
Teas Section 8 & 9 Received
Apr 8, 2008
Case File In Ticrs
Nov 30, 2002
Registered And Renewed (First Renewal - 10 Yrs)
Nov 30, 2002
Registered - Sec. 8 (10-Yr) Accepted/Sec. 9 Granted
Aug 30, 2002
Registered - Combined Section 8 (10-Yr) & Sec. 9 Filed
Aug 30, 2002
Paper Received
Jan 3, 1989
Registered - Sec. 8 (6-Yr) Accepted & Sec. 15 Ack.
Dec 5, 1988
Response Received To Post Reg. Action
Nov 8, 1988
Post Registration Action Mailed - Sec. 8 & 15
Jul 21, 1988
Registered - Sec. 8 (6-Yr) & Sec. 15 Filed
Oct 5, 1982
Registered-Principal Register
Jul 13, 1982
Published For Opposition
Trademark Alertz updated from USPTO on 2030-01-24
